Description | Pct. of Time |
Develop and manage the applicable policies, procedures, and SOP’s required for cleanroom maintenance, access, and training during day-to-day operations. | 25% |
Train and supervise users of the E-Beam lithography system including working with individual users in development and application of this specific technology. | 25% |
Oversee and provide training on cleanroom equipment/instrumentation, maintain records of instrument usage, and conduct routine maintenance and repair of instrumentation and equipment in the facility. | 20% |
Cross train and assist in the Center for Microscopy and Imaging as needed to provide training and support on electron microscopy instrumentation. | 15% |
Ensure the facility complies with the University general health and safety standards and maintain all records, inspections, and safety procedures required for such compliance. | 10% |
Perform other duties as requested by supervisor. | 5% |
Total | 100% |
Requirement/Condition | Frequency |
Work performed in a normal office environment. | Frequent |
Work performed in an environment requiring exposure to weather extremes. | Never |
Work performed in an environment requiring exposure to fumes, odors and noise. | Occasional |
Requirement/Condition | Frequency |
Physical effort with some handling of light weight such as supplies or materials (0 to 15 lbs). | Constant |
Physical efforts including standing, lifting and carrying light to moderately heavy materials or equipment. (15 to 50 lbs). | Occasional |
Physical effort such as pushing, pulling, bending, lifting, and carrying heavy objects (50 + lbs). | Never |
Requirement/Condition | Frequency |
Demands require close visual attention. | Frequent |
Demands require prolonged mental concentration. | Frequent |
Requirement/Condition | Frequency |
Exposure to hazards that may result in some injury, lost time, or threat to one's personal health. | Occasional |
Exposure to job hazards that may result in injury, lost time, total disability or death. | Never |